Semiconductor processing flow field control apparatus and method

A method, comprising:

• sensing, by at least one sensor, one or more processing parameters in a process chamber of a semiconductor processing apparatus, the process chamber coupled to a load port configured to receive a semiconductor wafer;
• controlling an operation of a fan in the process chamber to vary at least one of a speed or a direction of a flow of fluid in the process chamber based on the sensed one or more processing parameters;
• and
• controlling an angle of opening of a door of the load port based on the sensed one or more processing parameters.

A semiconductor processing system, comprising:

• a plurality of load ports, each of the load ports configured to receive a semiconductor wafer;
• a plurality of process chambers respectively coupled to the plurality of load ports;
• a plurality of fans respectively positioned in the plurality of process chambers, each of the plurality of fans configured to selectively vary a flow of fluid in a respective process chamber;
• a plurality of sensors respectively positioned in the plurality of process chambers, each of the plurality of sensors configured to sense one or more processing parameters in the respective process chamber;
• and
• a controller coupled to the plurality of sensors and to the plurality of fans, the controller configured to control an operation of the fans to vary at least one of a speed or a direction of the flow of fluid in the process chambers based on the sensed one or more processing parameters, and control an angle of opening of a door of at least one of the plurality of load ports based on the sensed one or more processing parameters.