Manufacturing method for array substrate

A manufacturing method of an array substrate, comprising steps of:

• providing a flexible substrate layer;
• forming a buffer layer on the flexible substrate layer;
• forming an active layer on the buffer layer, and patterning the active layer;
• forming a gate insulating layer on the active layer;
• forming a gate layer on the gate insulating layer by using a pulsed laser to melt copper nanoparticles, wherein a wavelength of the pulsed laser ranges from 350 to 1064 nm, and a scanning speed of the pulsed laser ranges from 5 to 10 mm/s;
• forming an interlayer insulating layer on the gate layer and defining openings in the interlayer insulating layer;
• patterning a source and drain layer on the interlayer insulating layer and in the openings;
• forming an organic planarization layer on the source and drain layer;
• and
• forming an anode layer on the organic planarization layer to obtain the array substrate.