Apparatus for uniform light intensity and methods of using the same

A system for planarizing a substrate, comprising:

• a substrate chuck to hold the substrate, wherein the substrate is configured to hold a formable material thereon;
• a superstrate chuck to hold a superstrate, wherein the superstrate chuck comprises one or more geometric features;
• and
• a diffusing element, wherein the diffusing element comprises a pattern aligned and corresponding with the one or more geometric features of the superstrate chuck, wherein the diffusing element is configured to allow actinic radiation beams to pass through to cure the formable material to form a layer and planarize the layer on the substrate;
• wherein the diffusing element comprises a first portion and a second portion, and wherein collimated light exiting the first portion exits as collimated beams and collimated light exiting the second portion exits as diffused beams;
• and
• wherein the first portion has a surface roughness that is less than a surface roughness of the second portion.