Back to results
US 11,443,922 B2Granted
High frequency power supply member and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsMichishige Saito, Yousuke Nagahata
Life of this patent
Estimating the term…
Abstract
A high frequency power supply member for supplying high frequency power includes: an inner conductor that forms a hollow; and an outer conductor arranged to surround the inner conductor, wherein a refrigerant flow path is provided inside a wall surface of at least one of the inner conductor and the outer conductor.
Claims10
A high frequency power supply member for supplying high frequency power, the high frequency power supply member comprising:
- an inner conductor that forms a hollow;
- and
- an outer conductor arranged to surround the inner conductor,
- wherein a refrigerant flow path is provided inside a wall surface of at least one of the inner conductor and the outer conductor.
1 more element
A plasma processing apparatus including a high frequency power supply member for supplying high frequency power,
- wherein the high frequency power supply member includes:
- an inner conductor that forms a hollow;
- and
- an outer conductor arranged to surround the inner conductor,
- wherein a refrigerant flow path is provided inside a wall surface of at least one of the inner conductor and the outer conductor.
2 more elements
Dependencies are inferred from the claim text.