Apparatus for treating substrate

An apparatus for treating a substrate, the apparatus comprising:

• a treatment vessel having a treatment space inside the treatment vessel;
• a substrate support unit configured to support the substrate in the treatment space;
• and
• a liquid dispensing unit configured to dispense a treatment liquid onto the substrate placed on the substrate support unit,
• wherein the liquid dispensing unit includes,
• a treatment liquid tube through which the treatment liquid flows,
• a constant-temperature water tube through which constant-temperature water flows, the constant-temperature water tube being configured to surround the treatment liquid tube, wherein the constant-temperature water tube is configured to have the constant-temperature water maintain the treatment liquid, which flows through the treatment liquid tube, at a set temperature,
• a constant-temperature water supply tube configured to supply the constant-temperature water to the constant-temperature water tube, and
• an activation member installed in the constant-temperature water supply tube and configured to activate ions in the constant-temperature water,
• wherein the constant-temperature water supply tube includes,
• an upstream-side supply tube configured to connect a constant-temperature water source and the activation member, and
• a downstream-side supply tube configured to connect the constant-temperature water tube and the activation member, and
• wherein the activation member is detachable from the upstream-side supply tube and the downstream-side supply tube.