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US 11,442,362 B2Granted
Additive manufacturing of architectured materials
AssigneeCalifornia Institute of Technology
InventorsAndrey Vyatskikh, Stephane J. Delalande, Julia R. Greer
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Abstract
This disclosure provides a scalable and reproducible process to create complex 3D metal materials with sub-micron features by applying lithographic methods to transparent metal- or inorganic-rich polymer resins.
Claims10
A method for manufacturing a sub-micron architectural material, comprising
- patterning a hybrid organic-inorganic polymer resin comprising photopolymerizable functional groups and having the general structure:
- Mn+(—R′OC—R)n
- where M is a metal, a metal ion, a metalloid, a metal alloy, a metal oxide, a metal nitride, an inorganic, an inorganic-organic hybrid and/or metal-inorganic composite material, wherein R is a C2-10 terminal alkene and R′ is N, O, F, S or Cl and wherein n is 1, 2, 3, 4, 5 or 6, in the presence of a photoinitiator using a single or two photon lithography technique to polymerize the polymer resin and generate the sub-micron architectural material having desired characteristic dimension of about 5 nm to 5 micron across.
Dependencies are inferred from the claim text.