Sample support body, production method for sample support body, and sample ionization method
AssigneeHamamatsu Photonics K.K.
InventorsYasuhide Naito, Takayuki Ohmura, Masahiro Kotani
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AssigneeHamamatsu Photonics K.K.
InventorsYasuhide Naito, Takayuki Ohmura, Masahiro Kotani
Estimating the term…
Provided is a sample support body that includes: a substrate having a first surface and a second surface opposite to each other; and a conductive layer provided on at least the first surface. A plurality of through-holes, which open to the second surface and a third surface of the conductive layer which is located on a side opposite to the substrate, are formed in the substrate and the conductive layer. At least one of the second surface and the third surface is subjected to surface treatment for providing a difference in an affinity with water between a surface close to the second surface and a surface close to the third surface.
A sample support body for ionization of a sample comprising:
A sample support body for ionization of a sample comprising
A production method for a sample support body for ionization of a sample comprising:
A production method for a sample support body for ionization of a sample comprising:
A sample ionization method comprising:
A sample ionization method comprising:
A sample ionization method comprising:
A sample ionization method comprising:
A sample ionization method comprising:
A sample ionization method comprising:
Dependencies are inferred from the claim text.