Defect classification device, inspection device, and inspection system

A defect classification device comprising:

• a storage device;
• and
• a signal processing device configured to acquire detection signals detected by a plurality of detection systems obtained by irradiating a wafer after a film formation process with a light, classify a defect on the wafer using signal intensities of the detection signals, and store a classification result in the storage device, wherein
• the signal processing device is configured to read out, from the storage device, instruction data for determining whether a signal obtained from a result of an inspection is a signal due to a defect, the instruction data being corresponding to film information of the wafer, compare the instruction data with a signal intensity ratio of the detection signals from at least two detection systems, and classify the defect on the wafer based on a result of the comparing,
• the instruction data is different for each film thickness included in the film information, and is data based on first signal intensity ratio data when the defect is a film swelling and based on second signal intensity ratio data when the defect is an on-film defect in the signal intensity ratio of at least two detection systems, and
• the signal processing device classifies the defect on the wafer according to a distance between the signal intensity ratio of the detection signals and the first signal intensity ratio data, and a distance between the signal intensity ratio of the detection signals and the second signal intensity ratio data.