Substrate liquid processing apparatus

A substrate liquid processing apparatus configured to perform a liquid processing on a processing surface of a substrate with a processing liquid, the substrate liquid processing apparatus comprising:

• a substrate holder configured to hold the substrate;
• a processing liquid supply configured to supply the processing liquid onto the processing surface of the substrate held by the substrate holder;
• and
• a heating unit configured to heat the processing liquid on the processing surface,
• wherein the heating unit comprises a heater, and a first sheet-shaped body and a second sheet-shaped body which are disposed to face the heater therebetween,
• the first sheet-shaped body is disposed between the heater and the processing surface,
• the heater comprises multiple heating elements provided in multiple heating zones of the heating unit, and
• at least one of the first sheet-shaped body or the second sheet-shaped body has a groove thereon, and the groove, formed on the at least one of the first sheet-shaped body or the second sheet-shaped body, is provided at a region corresponding to a boundary between neighboring heating zones among the multiple heating zones.