Method and device for shaping radiation for laser processing

A method for beam shaping in a laser processing process, the method comprising:

• in a laser assemblage, focusing a laser beam onto a processing/imaging plane;
• adapting an intensity distribution of the laser beam by way of at least one beam shaper;
• and
• in order to avoid uniformity defects in the processing/imaging plane, splitting the laser beam by way of at least one beam splitter into at least two partial or individual beams, wherein one of the partial or individual beams are differently influenced and each partial or individual beam is constituted from a laser source having a different wavelength, in such a way that after the partial or individual beams are combined and focused onto the processing/imaging plane, the partial or individual beams form an output beam having an intensity profile, wherein adjacent intensity maxima of the intensity profile differ in terms of at least one or several light properties in order to exclude a formation of interference, wherein the method is used in laser processing systems for laser ablation, laser drilling, laser marking, laser soldering and laser welding, laser cutting, laser sintering and hardfacing, laser cleaning, laser hardening, laser remelting, laser alloying and dispersing, or laser polishing.

An apparatus, comprising:

• a computer unit;
• a laser source;
• and
• a beam shaper, wherein a laser beam from the laser source is focusable onto a processing/imaging plane, wherein the laser beam is adaptable in terms of an intensity distribution thereof by way of the beam shaper;
• an arrangement for focusing a laser beam onto a processing/imaging plane;
• an arrangement for adapting an intensity distribution of the laser beam by way of the beam shaper;
• and
• in order to avoid uniformity defects in the processing/imaging plane, an arrangement for splitting the laser beam by way of at least one beam splitter into at least two partial or individual beams, wherein one of the partial or individual beams are differently influenced and each partial or individual beam is constituted from a second laser source having a different wavelength, in such a way that after the partial or individual beams are combined and focused onto the processing/imaging plane, the partial or individual beams form an output beam having an intensity profile, wherein adjacent intensity maxima of the intensity profile differ in terms of at least one or several light properties in order to exclude a formation of interference, wherein the laser beam is splittable by way of the at least one beam splitter into the partial or individual beams or each partial or individual beam is generatable from the laser source having a different wavelength, wherein by way of the beam shaper and/or delay units and/or wavelength manipulators that can be addressable by the computer unit, the partial or individual beams are influenceable differently in terms of phase, polarization, wavelength, and/or intensity profiles thereof, wherein after the partial or individual beams are combined using a beam combining system and are focused onto the processing/imaging plane, an output beam having an intensity profile is formable, wherein adjacent intensity maxima of the intensity profile differ in terms of at least one or several light properties in order to rule out an occurrence of interference.