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US 11,440,009 B2Granted
Plurality of filters
AssigneeHewlett-Packard Development Company, L.P.
InventorsChien-Hua Chen, Michael W. Cumbie, Devin Alexander Mourey
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Abstract
A method may include etching a number of holes into a carrier wafer layer to form a plurality of filters in the carrier wafer layer, patterning a chamber layer over a first side of the carrier wafer layer to form chambers above each filter formed in the carrier wafer layer, forming a layer over the chamber layer, grinding a second side of the carrier wafer layer to expose the number of holes etched into the carrier wafer layer, and bonding a molded substrate to the carrier wafer layer opposite the chamber layer.
Claims20
A fluidic microelectromechanical system (MEMS) device, comprising:
- a substrate;
- a die bonded to the substrate;
- and
- a top layer bonded to the die opposite the substrate, wherein the top layer and the substrate each comprise a wall to form a chamber to retain an analyte between the top layer and substrate within the MEMS device;
- a number of measurement electrodes disposed within the chamber;
- a number of stand-off features disposed within the chamber, wherein the number of stand-off features:
- are not a full height of the chamber;
- and
- form a lattice structure wherein smaller components of an analyte pass between sections of the lattice structure;
- and
- a crossflow microfluidic channel comprising a flowing inert fluid, wherein the crossflow microfluidic channel is perpendicular to the chamber to draw, via crossflows, the analyte away from the chamber;
- wherein the die comprises a plurality of filters with each filter comprising a number of holes defined through the die perpendicular to a plane formed by the substrate;
- and
- wherein an interface between the substrate, die, and top layer creates a serpentine fluidic flow through the plurality of filters.
11 more elements
A method, comprising:
- etching a number of holes into a carrier wafer layer to form a plurality of filters in the carrier wafer layer;
- patterning a chamber layer over a first side of the carrier wafer layer to form chambers above each filter formed in the carrier wafer layer;
- forming a top layer over the chamber layer;
- forming a number of stand-off features within the chamber, wherein the number of stand-off features:
- are not a full height of the chamber;
- and
- form a lattice structure wherein smaller components of an analyte pass between sections of the lattice structure;
- forming an intermediate top layer filter within a chamber and defined in the top layer;
- grinding a second side of the carrier wafer layer to expose the number of holes etched into the carrier wafer layer;
- bonding a molded substrate to the carrier wafer layer opposite the chamber layer;
- and
- forming a crossflow microfluidic channel comprising a flowing inert fluid, wherein the crossflow microfluidic channel is perpendicular to the chamber to draw, via crossflows, the analyte away from the chamber.
9 more elements
A device, comprising:
- a plurality of filters formed vertically through a silicon layer of the device, wherein the plurality of filters have different vertical heights;
- a number of cross-flowing microfluidic channels placed between at least two of the filters, wherein:
- filters in a first cross-flowing microfluidic channel have a first spacing and filters in a second cross-flowing microfluidic channel have a second spacing;
- a top layer bonded to the silicon layer and a substrate bonded to the silicon layer each comprise walls to form a chamber retain an analyte between the top layer and substrate within the device;
- a number of stand-off features disposed within the chamber, wherein the number of stand-off features:
- are not a full height of the chamber;
- and
- form a lattice structure wherein smaller components of the analyte pass between sections of the lattice structure;
- an inert fluid within a perpendicular crossflow microfluidic channel to draw, via crossflows, the analyte away from the chamber;
- a number of horizontal filters formed on the silicon layer to direct, via crossflows, the analyte to another filter;
- a number of electrodes, acting as pumps, formed on the silicon layer of the device within the microfluidic channels;
- wherein the plurality of filters each comprise a number of holes defined through their respective layer.
9 more elements
Dependencies are inferred from the claim text.