Display substrate and manufacturing method thereof

A manufacturing method of a display substrate, the display substrate being divided to have a non-pixel region and a color pixel region, the manufacturing method of the display substrate comprising:

• forming a thin film transistor (TFT) on a base substrate in the non-pixel region;
• forming a passivation layer on the TFT;
• forming a color filter on the passivation layer in the color pixel region;
• forming a planarization layer on the passivation layer and the color filter;
• thinning a thickness of a portion of the planarization layer located in the color pixel region so that the thickness of the portion of the planarization layer located in the color pixel region is smaller than a thickness of a portion of the planarization layer located in the non-pixel region, the portion of the planarization layer located in the color pixel region is a thinner planarization layer and the thickness of the portion of the planarization layer located in the color pixel region is in a range from about 0 μm to about 1.5 μm, and a thickness of a portion of the planarization layer located in the non--pixel region is in a range from about 3 μm to about 3.5 μm:
• and
• forming a display electrode on the planarization layer and connecting the display electrode to a drain electrode of the TFT through a via hole.