Electrostatic chuck and method for manufacturing protrusions thereof

A method for manufacturing an electrostatic chuck, comprising:

• forming a dielectric layer wrapping around an electrode of the electrostatic chuck;
• forming a patterned mask over the dielectric layer;
• generating a carbon plasma from a graphite target in a chamber and depositing a hydrogen-free amorphous carbon layer over the dielectric layer at a deposition temperature of less than or equal to about 80° C.;
• and
• removing the patterned mask to form hydrogen-free amorphous carbon protrusions, wherein the hydrogen-free amorphous carbon protrusions have a resistivity ranging from 10−4Ω·cm˜109Ω·cm to avoid hydrogen dissociation and fall off the hydrogen-free amorphous carbon protrusions, and
• wherein generating the carbon plasma from the graphite target and depositing the hydrogen-free amorphous carbon layer include:
• placing the graphite target in a first region of the chamber,
• applying an electrical arc to cause the graphite target in the first region of the chamber to generate the carbon plasma,
• applying a filter magnetic field in a second region of the chamber to filter out macroparticles and atomic groups from the carbon plasma, and
• applying a focus magnetic field in a third region of the chamber to move the filtered carbon plasma onto a surface of the dielectric layer of the electrostatic chuck.