Substrate liquid treatment apparatus
AssigneeTokyo Electron Limited
InventorsKoji Tanaka, Toshiyuki Shiokawa, Koji Yamashita, Hiroyuki Masutomi, Hitoshi Kosugi, Takao Inada, Takashi Ikeda, Tsukasa Hirayama
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AssigneeTokyo Electron Limited
InventorsKoji Tanaka, Toshiyuki Shiokawa, Koji Yamashita, Hiroyuki Masutomi, Hitoshi Kosugi, Takao Inada, Takashi Ikeda, Tsukasa Hirayama
Estimating the term…
A substrate liquid treatment apparatus includes an inner tank configured to store a treatment liquid and having an upper opening, an outer tank disposed outside the inner tank, and a lid movable between a close position for closing the upper opening of the inner tank and an open position for opening the upper opening of the inner tank. The lid includes a main portion that covers the upper opening of the inner tank when the lid is positioned at the close position, and a splash shielding portion connected to the main portion. When the lid is positioned at the close position, the splash shielding portion extends from a position higher than an upper end of a side wall of the inner tank adjacent to the splash shielding portion to a position which is lower than the upper end of the side wall and which is on the outer tank side of the side wall.
A substrate liquid treatment apparatus comprising:
Dependencies are inferred from the claim text.