Active gas generation apparatus and deposition processing apparatus
AssigneeToshiba Mitsubishi-Electric Industrial Systems Corporation
InventorsKensuke Watanabe, Shinichi Nishimura, Ren Arita
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AssigneeToshiba Mitsubishi-Electric Industrial Systems Corporation
InventorsKensuke Watanabe, Shinichi Nishimura, Ren Arita
Estimating the term…
In the present invention, a gas passing groove, a high-voltage electrode groove and a ground electrode groove formed in an electrode unit base are each spiral in plan view. A high-voltage electrode is embedded in the high-voltage electrode grove, and a ground electrode is embedded in the ground electrode groove. The high-voltage electrode and the ground electrode are arranged on sides of opposite side surfaces of the gas passing groove in the electrode unit base to oppose each other with a portion of the electrode unit base and the gas passing groove therebetween, and are spiral in plan view along with the gas passing groove.
An active gas generation apparatus generating active gas by activating source gas supplied to a discharge space in which a dielectric barrier discharge is generated, said active gas generation apparatus comprising:
Dependencies are inferred from the claim text.