Method and system for reducing layout distortion due to exposure non-uniformity
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChi-Ta Lu, Chia-Hui Liao, Yihung Lin, Chi-Ming Tsai
Life of this patent
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Abstract
A method, a non-transitory computer-readable storage medium and a system for adjusting a design layout are provided. The method includes: receiving a design layout including a feature in a peripheral region of the design layout; determining a first compensation value associated with the peripheral region according to an exposure distribution in an exposure field of a workpiece; and adjusting the design layout by modifying a shape of the feature according to the compensation value.
Claims20
A method, comprising:
- receiving a design layout comprising a feature in a peripheral region of the design layout;
- performing model-based optical proximity correction on the design layout by dissecting edges of the feature by dissection lines;
- determining compensation values associated with a pellicle assembly and the peripheral region according to an exposure distribution in an exposure field of a workpiece;
- adjusting the design layout by modifying a shape of the feature according to the compensation values;
- and
- manufacturing a mask according to the design layout,
- wherein the modifying of the shape of the feature according to the compensation values comprises:
- partitioning the peripheral region into compensation zones, wherein the feature comprises portions disposed within the respective compensation zones;
- assigning the compensation values to the respective compensation zones;
- and
- reducing line widths of the portions of the feature according to the compensation values associated with the respective compensation zones.
The method according to 1, wherein assigning compensation values to the respective compensation zones comprises assigning a first compensation value associated with a first compensation zone and a second compensation value associated with a second compensation zone, the second compensation value being less than the first compensation value and the first compensation zone being closer to a side of the design layout than the second compensation zone.
A non-transitory computer-readable storage medium, comprising instructions which, when executed by a processor, perform the steps of:
- receiving a design layout comprising a feature in a peripheral region of the design layout;
- performing model-based optical proximity correction on the design layout;
- determining compensation values associated with the peripheral region according to a reflectivity of a pellicle assembly, the pellicle assembly being disposed over a mask;
- adjusting the design layout by modifying a shape of the feature according to the compensation values through the steps of:
- partitioning the peripheral region into compensation zones, wherein the feature comprises portions disposed within the respective compensation zones;
- assigning the compensation values to the respective compensation zones;
- and
- reducing line widths of the portions of the feature according to the compensation values associated with the respective compensation zones;
- and
- causing the mask to be manufactured according to the design layout.
A system, comprising a processor and one or more programs including instructions which, when executed by the processor, cause the system to:
- receive a design layout comprising a feature in a peripheral region of the design layout;
- performing model-based optical proximity correction on the design layout;
- determine compensation values associated with a pellicle assembly and the peripheral region according to an exposure distribution in an exposure field of a workpiece;
- adjust the design layout by modifying a shape of the feature according to the compensation values through the steps of:
- partitioning the peripheral region into compensation zones, wherein the feature comprises portions disposed within the respective compensation zones;
- assigning the compensation values to the respective compensation zones;
- and
- reducing line widths of the portions of the feature according to the compensation values associated with the respective compensation zones;
- and
- perform a lithography operation that transfers the shape of the feature to the workpiece.
Dependencies are inferred from the claim text.