Extreme ultraviolet light generating apparatus, extreme ultraviolet light generating method, and electronic device manufacturing method

An extreme ultraviolet light generating method for generating extreme ultraviolet light in a chamber, the extreme ultraviolet light generating method comprising:

• a pressure obtaining step of obtaining information on pressure in the chamber;
• a gas introducing step of introducing gas into the chamber;
• an exhausting step of exhausting the gas from the chamber;
• and
• a controlling step of switching between application and non-application of a voltage to a piezoelectric element provided in the chamber,
• the controlling step including determining whether or not to apply a voltage to the piezoelectric element provided in the chamber based on the information on the pressure in the chamber obtained in the pressure obtaining step.

An electronic device manufacturing method comprising:

• irradiating a target substance supplied into a chamber with a laser beam introduced into the chamber to generate plasma from which extreme ultraviolet light is generated, with an extreme ultraviolet light generating apparatus, the extreme ultraviolet light generating apparatus including
• the chamber,
• a piezoelectric element provided in the chamber,
• a pressure sensor configured to detect pressure in the chamber,
• a gas introducing unit configured to introduce gas into the chamber,
• an exhaust unit configured to exhaust the gas from the chamber, and
• a control unit configured to control application of a voltage to the piezoelectric element, the control unit being configured to determine whether or not to apply a voltage to the piezoelectric element based on information on the pressure in the chamber obtained by the pressure sensor;
• outputting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing the extreme ultraviolet light onto a photosensitive substrate within the exposure apparatus.