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US 11,307,496 B2Granted
Metal brush layer for EUV patterning
AssigneeInternational Business Machines Corporation
InventorsEkmini Anuja De Silva, Jing Guo, Jennifer Church, Dario Goldfarb
Life of this patent
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Abstract
A metal brush layer is provided. The metal brush layer includes a polymer backbone including at least one grafting unit, G, attached to the polymer backbone, and a plurality of metal-containing moieties, M, attached to the polymer backbone.
Claims20
A metal brush layer, comprising:
- a polymer backbone including at least one grafting unit, G, attached to the polymer backbone;
- and
- a plurality of metal-containing moieties, M, attached to the polymer backbone.
A metal brush layer, comprising:
- a polymer backbone including at least one grafting unit, G, attached to a terminal monomer of the polymer backbone;
- a plurality of metal-containing moieties, M, attached to the polymer backbone;
- and
- a plurality of first adhesion promoters, A1, attached to the polymer backbone, wherein the plurality of adhesion promotors, A, occur as a first block along the polymer backbone, and the plurality of metal-containing moieties, M, occur as a second block along the polymer backbone.
1 more element
An EUV lithography stack, comprising:
- a metal brush layer on a substrate;
- and
- a resist layer on the metal brush layer, wherein the metal brush layer includes a polymer backbone including at least one grafting unit, G, attached to the polymer backbone, and a plurality of metal-containing moieties, M, attached to the polymer backbone.
Dependencies are inferred from the claim text.