Mask, mask assembly, exposure machine, method for testing shadowing effect on window, and photolithography method

A mask assembly, comprising a plurality of masks, wherein each mask comprises:

• a light transmission area;
• a functional window comprising at least one of an alignment mark window and a gap window, provided at a side of the light transmission area;
• and
• a first detection mark and a second detection mark;
• wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask;
• the second detection mark is disposed between the profile of the light transmission area and the functional window;
• the first detection mark comprises a first sub-mark and a second sub-mark;
• the first sub-mark is disposed at a side of the alignment mark window;
• and
• the second sub-mark is disposed at a side of the gap window.

A method for testing shadowing effect on a window through a mask, wherein the mask comprises:

• a light transmission area;
• a functional window comprising at least one of an alignment mark window and a gap window, provided at a side of the light transmission area;
• and
• a first detection mark and a second detection mark:
• wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask;
• the second detection mark is disposed between the profile of the light transmission area and the functional window:
• the first detection mark comprises a first sub-mark and a second sub-mark:
• the first sub-mark is disposed at a side of the alignment mark window:
• and
• the second sub-mark is disposed at a side of the gap window, wherein the method comprises:
• optically inspecting a substrate to determine whether a first mark or a second mark is formed on the substrate by the first detection mark or the second detection mark.