Valve device, processing apparatus, and control method

A processing apparatus comprising:

• a process vessel in which a substrate as a processing target is accommodated;
• and
• a valve device configured to control a processing gas supplied to the process vessel,
• wherein the valve device comprises:
• a plurality of valves configured to control a flow of a plurality of processing gases supplied to the process vessel;
• a housing in which a plurality of first flow paths through which the processing gases flow is formed;
• a heat diffuser configured to cover the housing and diffuse heat of the housing;
• a heat insulation configured to cover the housing covered with the heat diffuser, and a heater embedded in the heat insulation and being configured to heat the housing via the heat diffuser;
• a supply configured to supply a coolant to a second flow path formed between the housing and the heat diffuser;
• and
• a controller configured to:
• control the heater so as to heat the housing to a first temperature when a film forming process is performed on the substrate accommodated in the process vessel;
• and
• after an end of the film forming process and before a start of a cleaning process of the process vessel, control the heater so as to stop heating of the housing, control the supply so as to supply the coolant to the second flow path, and control at least one of the valves such that a gas having a temperature lower than the first temperature flows through each of the first flow paths.

A method of controlling a processing apparatus, which comprises:

• a plurality of valves configured to control a flow of a plurality of processing gases supplied to a process vessel;
• a housing in which a plurality of first flow paths through which the processing gases flow is formed;
• a heat diffuser configured to cover the housing and diffuse heat of the housing;
• a heat insulation configured to cover the housing covered with the heat diffuser, and a heater embedded in the heat insulation and being configured to heat the housing via the heat diffuser;
• a supply configured to supply a coolant to a second flow path formed between the housing and the heat diffuser;
• and a controller, the method comprising:
• heating the housing by controlling the heater so as to heat the housing to a first temperature when a film forming process is performed on a target substrate accommodated in the process vessel;
• and
• after an end of the film forming process and before a start of a cleaning process of the process vessel, cooling the housing by controlling the heater so as to stop the heating of the housing, by controlling the supply so as to supply the coolant to the second flow path, and by controlling at least one of the valves such that a gas having a temperature lower than the first temperature flows through each of the first flow paths.