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US 11,306,393 B2Granted
Methods and apparatus for ALD processes
AssigneeApplied Materials, Inc.
InventorsJeffrey A. Kho, Chien-Teh Kao, Jianhua Zhou
Life of this patent
Estimating the term…
Abstract
The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels.
Claims19
A lid assembly for use in an atomic layer deposition (ALD) chamber, the lid assembly comprising:
- a multi-channel showerhead having a first side and an opposing second side parallel to the first side, the multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, wherein each of the first gas channels has a plurality of first orifices extending from the first gas channel to a face of the multi-channel showerhead and each of the second gas channels has a plurality of second orifices extending from the second gas channel to the face of the multi-channel showerhead;
- and
- a flow guide having a first manifold positioned at the first side and a second manifold positioned at the second side, each of the manifolds being fluidly coupled to the plurality of second gas channels that extend linearly between the first manifold and the second manifold, wherein the first manifold is oriented to direct a gas in a first direction through the plurality of second gas channels and the second manifold is oriented to direct a gas in a second direction through the plurality of second gas channels across the multi-channel showerhead, the second direction being opposite to the first direction.
A lid assembly for use in an atomic layer deposition (ALD) chamber, the lid assembly comprising:
- a multi-channel showerhead having a first side and an opposing second side parallel to the first side, wherein the multi-channel showerhead includes a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and wherein each of the first gas channels has a plurality of first orifices extending from the first gas channel to a face of the multi-channel showerhead and each of the second gas channels has a plurality of second orifices extending from the second gas channel to the face of the multi-channel showerhead;
- a dielectric skirt surrounding the multi-channel showerhead;
- and
- a flow guide having a first manifold positioned at the first side and a second manifold positioned at the second side, wherein each of the manifolds are fluidly coupled to the plurality of second gas channels that extend linearly between the first manifold and the second manifold, and wherein the first manifold is oriented to direct a gas in a first direction through the plurality of second gas channels and the second manifold is oriented to direct a gas in a second direction through the plurality of second gas channels across the multi-channel showerhead, the second direction being opposite to the first direction.
1 more element
A lid assembly for use in an atomic layer deposition (ALD) chamber, the lid assembly comprising:
- a multi-channel showerhead having a first side and an opposing second side parallel to the first side, wherein the multi-channel showerhead includes a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and wherein each of the first gas channels has a plurality of first orifices extending from the first gas channel to a face of the multi-channel showerhead and each of the second gas channels has a plurality of second orifices extending from the second gas channel to the face of the multi-channel showerhead;
- a dielectric skirt surrounding the multi-channel showerhead;
- and
- a flow guide having a first manifold positioned at the first side and a second manifold positioned at the second side, each of the manifolds being fluidly coupled to the plurality of second gas channels that extend linearly between the first manifold and the second manifold, wherein the first manifold is oriented to direct a gas in a first direction through the plurality of second gas channels and the second manifold is oriented to direct a gas in a second direction through the plurality of second gas channels across the multi-channel showerhead, the second direction being opposite to the first direction.
1 more element
Dependencies are inferred from the claim text.