Material comprising a stack having thermal and esthetic properties

A material comprising a transparent substrate, on at least one surface of which is deposited a stack of layers comprising three silver-based functional metal layers, F1, F2 and F3, with physical thicknesses EF1, EF2 and EF3 respectively, and four dielectric assemblies of layers, E1, E2, E3 and E4, with optical thicknesses EO1, EO2, EO3 and EO4 respectively, each of the silver-based functional metal layers, F1, F2 and F3, being positioned respectively between the two dielectric assemblies of layers, E1 and E2, E2 and E3, and E3 and E4, wherein:

• the dielectric assembly of layers E1 includes all dielectric layers arranged between the transparent substrate and the functional metal layer F1, the dielectric assembly of layers E2 includes all dielectric layers arranged between the functional metal layer F1 and the functional metal layer F2, the dielectric assembly of layers E3 includes all dielectric layers arranged between the functional metal layer F2 and the functional metal layer F3, and the dielectric assembly of layers E4 includes at least two dielectric layers that are closest to the functional metal layer F3,
• a ratio of the physical thickness EF1 of the functional metal layer F1 to the physical thickness EF2 of the functional metal layer F2 is between 0.95 and 1.05;
• the physical thickness EF3 of the functional metal layer F3 is greater than the physical thicknesses EF1 of the functional metal layer F1 and the physical thickness EF3 of the functional metal layer F3 is greater than the physical thickness EF2 of the functional metal layers F2;
• the optical thickness EO2 of the dielectric assembly of layers E2 is between 60 and 80 nm;
• the optical thickness EO1 of the dielectric assembly of layers E1 is between 200 and 250 nm;
• the optical thicknesses EO1, EO2, EO3 and EO4 are such that EO2<EO4<EO3<EO1;
• the dielectric assembly of layers E4 comprises at least one layer which absorbs infrared radiation with a physical thickness of between 0.1 nm and 5 nm.