Device and method for cleaning monocrystalline pulling apparatus

A device for cleaning a monocrystalline pulling apparatus in which a semiconductor monocrystal is pulled from semiconductor melt stored in a crucible installed below a pull chamber by a wire suspended in the pull chamber of a sealed vessel, the device comprising:

• a main tube unit to be inserted into the pull chamber;
• an inner surface cleaning mechanism that is provided at an upper part of the main tube unit and cleans an inner surface of the pull chamber;
• and
• an axial position regulating mechanism that is provided at a lower part of the main tube unit and regulates an axial position of the main tube unit with respect to a direction of a central axis of the pull chamber in a state where the main tube unit is inserted into the pull chamber;
• wherein the inner surface cleaning mechanism includes a wiper member that is provided on an outer peripheral surface of the main tube unit and is in contact with the inner surface of the pull chamber in a state where the main tube unit is inserted into the pull chamber,
• the main tube unit includes:
• a retreat/housing section into which a seed chuck provided at a lower end of the wire retreats and which houses the seed chuck therein;
• a bottom that is provided at a lower part of the retreat/housing section;
• and
• a continuous extension mechanism that is connected to the bottom and to which a plurality of extension rods are added and joined in an axial direction,
• a partition wall is provided as the bottom of the retreat/housing section, and
• the axial position regulating mechanism includes a guide member that is provided on an outer peripheral surface of the main tube unit and is in contact with the inner surface of the pull chamber in a state wherein the main tube unit is inserted into the pull chamber, wherein the guide member is spaced apart from the wiper member, and wherein the guide member is not in direct contact with the wiper member.