Laminate
AssigneeLG Chem, Ltd.
InventorsMi Sook Lee, Se Jin Ku, No Jin Park, Jung Keun Kim, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Sung Soo Yoon
Life of this patent
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Abstract
The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.
Claims17
A laminate comprising a block copolymer film which comprises a block copolymer comprising a polymer segment A satisfying one or more of Conditions 1 to 3 below and a polymer segment B different from the polymer segment A and having an absolute value of a difference in surface energy with the polymer segment A of 10 mN/m or less;
- and
- a random copolymer film which is formed in contact with the block copolymer film and comprises a random copolymer comprising a monomer unit of Formula 1 below and a monomer unit of Formula 3 below, wherein in the random copolymer, the monomer unit of Formula 3 has a volume fraction in a range of 0.45 to 0.65 and the sum of volume fraction of the monomer unit of Formula 1 and the volume fraction of the monomer unit of Formula 3 is 1:
- Condition 1:
- it exhibits a melting transition peak or an isotropic transition peak in a range of −80° C. to 200° C. in a differential scanning calorimetry (DSC) analysis,
- Condition 2:
- it exhibits a peak having a half-value width in a range of 0.2 to 0.9 nm−1 within a scattering vector (q) range of 0.5 nm−1 to 10 nm−1 in an X-ray diffraction (XRD) analysis,
- Condition 3:
- it comprises a side chain, which satisfies Equation 1 below:
- 3 nm−1 to 5 nm−1=nq/(2×π) [Equation 1]
- wherein, n is a number of chain-forming atoms in the side chain and q is the smallest scattering vector in which a peak is observed in the XRD analysis for the block copolymer or the scattering vector in which a peak of the largest peak area is observed,
- wherein, R is hydrogen or an alkyl group having 1 to 4 carbon atoms, X is a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X1— or —X1—C(═O)—, where X1 is an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group, and Y is a monovalent substituent comprising a ring structure to which a side chain having 8 or more chain-forming atoms is linked,
- wherein, X2 is a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X1— or —X1—C(═O)—, where X1 is a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group, and W is an aryl group containing at least one halogen atom.
A method for producing a patterned substrate comprising forming a random copolymer film which comprises a random copolymer comprising a monomer unit of Formula 1 below and a monomer unit of Formula 3 below on a substrate, wherein in the random copolymer, the monomerunit of Formula 3 has a volume fraction in a range of 0.45 to 0.65 and the sum of volume fraction of the monomer unit of Formula 1 and the volume fraction of the monomer unit of Formula 3 is 1, and forming a self-assembled block copolymer film in contact with the random copolymer film, wherein the block copolymer film comprises a block copolymer which comprises a polymer segment A satisfying one or more of Conditions 1 to 3 below and a polymer segment B different from the polymer segment A and having an absolute value of a difference in surface energy with the polymer segment A of 10 mN/m or less:
- Condition 1:
- it exhibits a melting transition peak or an isotropic transition peak in a range of −80° C. to 200° C. in a differential scanning calorimetry (DSC) analysis,
- Condition 2:
- it exhibits a peak having a half-value width in a range of 0.2 to 0.9 nm−1 within a scattering vector (q) range of 0.5 nm−1 to 10 nm−1 in an X-ray diffraction (XRD) analysis,
- Condition 3:
- it comprises a side chain, which satisfies Equation 1 below:
- 3 nm−1 to 5 nm−1=nq/(2×π) [Equation 1]
- wherein, n is a number of the-chain-forming atoms in the side chain and q is the smallest scattering vector in which a peak is observed in the XRD analysis for the block copolymer or the scattering vector in which a peak of the largest peak area is observed,
- wherein, R is hydrogen or an alkyl group having 1 to 4 carbon atoms, X is a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X1— or —X1—C(═O)—, where X1 is an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group, and Y is a monovalent substituent comprising a ring structure to which a side chain having 8 or more chain-forming atoms is linked,
- wherein, X2 is a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X1— or —X1—C(═O)—, where X1 is a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group, and W is an aryl group containing at least one halogen atom.
Dependencies are inferred from the claim text.