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US 11,299,572 B2Granted
Block copolymer
AssigneeLG Chem, Ltd.
InventorsJe Gwon Lee, No Jin Park, Jung Keun Kim, Eun Young Choi, Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Sung Soo Yoon
Life of this patent
Estimating the term…
Abstract
The present application can provide a block copolymer and a use thereof. The block copolymer of the present application can have excellent self-assembly properties or phase separation characteristics and excellent etching selectivity, and various other functions as required can be freely imparted thereto.
Claims18
A block copolymer comprising a polymer segment A having a unit represented by Formula 1 below and a polymer segment B different from the polymer segment A:
- wherein, R is hydrogen or an alkyl group having 1 to 4 carbon atoms, X is an oxygen atom, —C(═O)—X1— or —X1—C(═O)—, where X1 is an oxygen atom or —SiH2—, and Y is a monovalent substituent comprising an aromatic ring structure to which a linear hydrocarbon chain having 8 or more chain-forming atoms is linked, where a carbon atom of the linear hydrocarbon chain is optionally replaced with oxygen, nitrogen or sulfur, and the linear hydrocarbon chain is substituted with a hydrocarbon functional group containing one or more silicon atoms or iron atoms.
Dependencies are inferred from the claim text.