Anomaly determination method and writing apparatus

An anomaly determination method using a writing apparatus, the writing apparatus comprising a first chamber capable of attaching a first grounding body to a processing target which has a conductive film and a resist film stacked on a substrate, the first grounding body configured to ground the processing target, or of accommodating the processing target for positioning the processing target, a second chamber capable of accommodating the processing target for writing a predetermined pattern to the processing target with a charged particle beam, and an arithmetic processing circuitry configured to determine a resistance value of the processing target, the method comprising:

• measuring a first resistance value of the processing target via the first grounding body and determining whether the first resistance value is less than a predetermined value, after the first grounding body is attached to the processing target and a pin portion of the first ground body breaks through the resist film to contact the conductive film, in the first chamber;
• transferring the first grounding body to the second chamber while being attached to the processing target, after measuring the first resistance value;
• bringing the first grounding body into contact with a second grounding body while being attached to the processing target in the second chamber, the second grounding body being configured to measure a second resistance value of the processing target via the first and second grounding bodies;
• determining an anomaly of the second grounding body with the arithmetic processing circuitry based on a trend of a resistance difference between the first resistance value and the second resistance value for a plurality of processing targets;
• and
• releasing electric charges accumulated in the processing target to ground via the first grounding body.