Mode-switching plasma systems and methods of operating thereof
AssigneeTokyo Electron Limited
InventorsPeter Ventzek, Alok Ranjan, Mitsunori Ohata, Michael Hummel
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AssigneeTokyo Electron Limited
InventorsPeter Ventzek, Alok Ranjan, Mitsunori Ohata, Michael Hummel
Estimating the term…
A plasma processing apparatus includes a plasma processing chamber, a coil having an uncoiled length L disposed adjacent to the plasma processing chamber, and a plurality of retractable conductors each configured to make electrical contact with the coil in an extended position. A first tap position is located substantially at a distance L/2 measured from a first end along the coil, a second tap position neighboring the first tap position and located substantially at the distance L/2 measured from the first end along the coil, and a third tap position located substantially at the first end of the coil. A controller is configured to operate the plasma processing apparatus in a first operating mode to sustain an inductively coupled plasma and in a second operating mode to sustain a capacitively coupled plasma using subsets of the retractable conductors in the extended position.
A plasma processing apparatus comprising:
A plasma processing apparatus comprising:
A method of plasma processing, the method comprising:
Dependencies are inferred from the claim text.