Imprint templates and methods for forming imprinted patterns using the same

An imprint template comprising:

• an imprint portion including imprinting patterns which are transferred into a first imprint shot region of a resist layer;
• and
• a photomask portion including light blocking patterns that provide a light permeation area corresponding to a boundary region defining a second imprint shot region of the resist layer,
• wherein the light blocking patterns include:
• a plurality of first light blocking patterns arranged to surround a field region comprised of the imprinting patterns;
• and
• a second light blocking pattern disposed to surround an array of the plurality of first light blocking patterns to have a frame-shaped feature in a plane view,
• wherein the field region is aligned with the first imprint shot region,
• one of the first light blocking patterns overlaps with the second imprint shot region of the resist layer, and
• the light permeation area is located to correspond to the boundary region defining the second imprint shot region as a next imprint shot region adjacent to the first imprint shot region.