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US 11,237,476 B2Granted
Pellicle frame and pellicle
AssigneeShin-Etsu Chemical Co., Ltd.
InventorYu Yanase
Life of this patent
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Abstract
The present invention is to provide a pellicle frame in a frame shape, having an upper end face to arrange a pellicle film thereon and a lower end face to face a photomask, and which is characterized by being provided with a notched part from an outer side face toward an inner side face of the upper end face, and to provide a pellicle characterized by including the pellicle frame as a component.
Claims9
A pellicle comprising:
- a pellicle frame having a frame shape, an upper end face and a lower end face to face a photomask;
- and
- a pellicle film arranged at the upper end face of the pellicle frame,
- wherein the pellicle frame is provided with at least one notched part from an outer side face toward an inner side face of the upper end face, and
- wherein the notched part is a ventilation part.
2 more elements
Dependencies are inferred from the claim text.