Imprint device, imprint method, and method for manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorYouji Kawasaki
Life of this patent
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Abstract
An imprint device which minimizes the occurrence of pattern defects. The imprint device for forming a pattern made of an imprint material on a shot region formed on a substrate using a mold includes: a supply unit configured to discharge the imprint material through a discharge port and supply the imprint material onto the substrate, a substrate stage configured to hold and move the substrate, and a control unit configured to control the substrate stage. The control unit moves the substrate stage so that a shot region having the pattern formed thereon avoids a portion immediately below the discharge port.
Claims8
An imprint device for forming a pattern made of an imprint material on a shot region formed on a substrate using a mold, comprising:
- a supply unit configured to discharge the imprint material through a discharge port and supply the imprint material onto the substrate;
- a substrate stage configured to hold and move the substrate;
- and
- a control unit configured to control the substrate stage, wherein the control unit is configured to control the substrate stage so as to move the substrate stage so that a shot region already having the pattern made of the imprint material formed thereon avoids a position immediately below the discharge port.
An imprint method for forming a pattern made of an imprint material on a shot region formed on a substrate using a mold, comprising:
- discharging the imprint material through a discharge port and supplying the imprint material onto the substrate;
- and
- moving the substrate so that a shot region already having the pattern made of the imprint material formed thereon avoids a position immediately below the discharge port when the substrate is moved.
A method for manufacturing an article using an imprint device for forming a pattern made of an imprint material using a mold on a shot region formed on a substrate, the method comprising:
- discharging the imprint material through a discharge port and supplying the imprint material onto the substrate;
- moving the substrate so that a shot region already having the pattern made of the imprint material formed thereon avoids a position immediately below the discharge port when the substrate is moved;
- and
- processing the substrate having the pattern formed in the above steps.
Dependencies are inferred from the claim text.