Substrate position calibration for substrate supports in substrate processing systems

Apparatus for calibrating a substrate position on a substrate support having a vacuum chuck, comprising:

• a calibration substrate configured to be placed on a substrate support comprising a solid disc having a diameter of 150 mm, 200 mm, 300 mm, or 450 mm, and a thickness of 450 micrometers to 1500 micrometers, wherein the solid disc is fabricated from quartz, silicon, silicon carbide, or aluminum nitride;
• and
• a plurality of through holes disposed through the solid disc along only a circle having a diameter of 92.6 percent to 97.5 percent of a diameter of the solid disc.

Apparatus for calibrating a substrate position on a substrate support having a vacuum chuck, comprising:

• a calibration substrate configured to be handled by standard semiconductor substrate handling equipment, the calibration substrate being a solid disc with the exception of a plurality of through holes disposed through the solid disc only along a circle centered on an upper surface of the solid disc, wherein a diameter of the circle is 92.6 percent to 97.5 percent of a diameter of the solid disc, and wherein the plurality of through holes are configured to facilitate a pressure measurement.