Control based on probability density function of parameter
AssigneeASML Netherlands B.V.
InventorsWim Tjibbo Tel, Marc Jurian Kea, Roy Anunciado
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Abstract
A method for determining adjustment to a patterning process. The method includes obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter, determining an asymmetry of the probability density function, and determining an adjustment to the patterning process based on the asymmetry of the probability density function of the parameter so as to reduce a probability of the feature having a parameter value that falls outside a range between threshold values of the parameter.
Claims20
A method for determining an adjustment to a patterning process, the method comprising:
- obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter;
- determining, by a hardware computer system, an asymmetry of the probability density function;
- and
- determining, by the hardware computer system, an adjustment to the patterning process based on the asymmetry of the probability density function of the parameter so as to reduce a probability of the feature having a parameter value that falls outside a range between threshold values of the parameter.
A method for determining an adjustment to a patterning process, the method comprising:
- obtaining (i) an input distribution of a control parameter of the patterning process, (ii) a behavior of the patterning process, (iii) an output distribution of a parameter of the patterning process based on the behavior of the patterning process and the input distribution of the control parameter, and (iv) a deviation in the output distribution from a benchmark distribution of the parameter;
- and
- determining, by a hardware computer system, the adjustment to the control parameter to reduce the deviation in the output distribution based on the behavior of the patterning process and the deviation in the output distribution of the parameter,
- wherein i) the deviation in the output distribution corresponds to values of the control parameter that are transformed by a non-linear part of the behavior of the patterning process into values of the parameter and ii) the transformed values of the control parameter correspond to a tail portion of the input distribution, the tail portion being defined beyond a two standard deviation from an average of the input distribution.
Dependencies are inferred from the claim text.