Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure system for a lithographic apparatus, the fluid handling structure system comprising:

• a first fluid handling structure having a first body having a plurality of openings, the first fluid handling structure configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table configured to support the substrate, the first fluid handling structure configured to supply liquid to a localized portion of the facing surface and to confine the liquid to the localized portion, and the openings are configured to extract liquid;
• and
• a second fluid handling structure having a second body physically separate from the first body of the first fluid handling structure when in the lithographic apparatus with the first fluid handling structure, the second body having one or more apertures directed, in use, towards the facing surface and having an outer edge at least partially curved in a plane parallel to the facing surface, and the second fluid handling structure is configured to extract liquid.

A fluid handling structure system for a lithographic apparatus, the fluid handling structure system comprising:

• a first fluid handling structure having a first body having a plurality of openings, the fluid handling structure configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table configured to support the substrate and the openings are configured to extract liquid;
• and
• a second fluid handling structure having a second body physically separate from the first body of the first fluid handling structure when in the lithographic apparatus with the first fluid handling structure, the second body of the second fluid handling structure having one or more first apertures directed, in use, towards the facing surface and configured to exhaust a fluid and having one or more second apertures directed, in use, towards the facing surface and configured to supply a fluid.