Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3
AssigneeInternational Business Machines Corporation
InventorsRobert L. Sandstrom, Peter H. Bartlau, Thomas B. Faure, Supratik Guha, Edward W. Kiewra, Louis M. Kindt, Alfred Wagner
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Abstract
The invention relates to a method used in a photolithographic process comprising depositing a film of Atomic Layered Deposition (ALD) Al2O3 on a photomask, subjecting said film of Al2O3 on the photomask to a plasma treatment and then irradiating the deposited film of ALD Al2O3 on the coated photomask at a wavelength of 193 nm.
Claims19
A method in a lithographic process comprising:
- depositing a film of Al2O3 on a photomask via an atomic layer deposition method (ALD);
- subjecting said film of ALD deposited Al2O3 on said photomask to a plasma treatment;
- and
- irradiating said film of ALD deposited Al2O3 on said photomask at a wavelength of 193 nm.
A computer program for depositing a film of Al2O3 on a photomask on a photomask via an atomic layer deposition method (ALD), said computer program product comprising:
- a computer readable storage medium having stored thereon:
- first program instructions executable by a processing circuit device to cause said device to deposit a film of Al2O3 on said photomask via an atomic layer deposition (ALD) method;
- and
- second program instructions executable by a processing circuit device to cause subjecting said photomask with said film of ALD Al2O3 thereon to a plasma treatment;
- and
- third program instructions executable by a processing circuit device to cause irradiation of said film of AID Al2O3 on said photomask at a wavelength of 1.93 nm.
A method in a lithographic process comprising:
- depositing a film of Al2O3 on a photomask via an atomic layer deposition method (ALD);
- subjecting said film of ALD deposited Al2O3 on said photomask to a plasma treatment;
- and
- irradiating said film of ALD deposited Al2O3 on said photomask at a wavelength of 193 nm,
- said photomask is formed of one of chromium on glass (COG) and opaque molybdenum silicide on glass (OMOG).
Dependencies are inferred from the claim text.