Transistor with an airgap spacer adjacent to a transistor gate
AssigneeIntel Corporation
InventorsChen-Guan Lee, Joodong Park, En-Shao Liu, Everett S. Cassidy-Comfort, Walid M. Hafez, Chia-Hong Jan
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AssigneeIntel Corporation
InventorsChen-Guan Lee, Joodong Park, En-Shao Liu, Everett S. Cassidy-Comfort, Walid M. Hafez, Chia-Hong Jan
Estimating the term…
A microelectronic transistor may be fabricated having an airgap spacer formed as a gate sidewall spacer, such that the airgap spacer is positioned between a gate electrode and a source contact and/or a drain contact of the microelectronic transistor. As the dielectric constant of gaseous substances is significantly lower than that of a solid or a semi-solid dielectric material, the airgap spacer may result in minimal capacitive coupling between the gate electrode and the source contact and/or the drain contact, which may reduce circuit delay of the microelectronic transistor.
A microelectronic transistor, comprising:
A microelectronic transistor, comprising:
An electronic system, comprising:
An electronic system, comprising:
Dependencies are inferred from the claim text.