Substrate support having customizable and replaceable features for enhanced backside contamination performance

A workpiece support, comprising:

• an electrostatic chuck (ESC) having a support surface;
• and
• one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs have a low thermal conductivity.

A workpiece support, comprising:

• an electrostatic chuck (ESC) having a support surface;
• and
• one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs and the support surface have similar dielectric strengths.

A workpiece support, comprising:

• an electrostatic chuck (ESC) having a support surface;
• and
• one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs are spaced along the support surface in a predetermined pattern, and wherein the one or more standoffs are initially defined on a transfer sheet, whereby the predetermined pattern is operable to be transferred from the transfer sheet to the support surface by placement of the transfer sheet on the support surface and selectively adhering the one or more standoffs from the transfer sheet to the support surface.

A workpiece support, comprising:

• an electrostatic chuck (ESC) having a support surface;
• and
• one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs are initially comprised of a liquid that is applied to the support surface and subsequently cured on the support surface.

A workpiece support, comprising:

• an electrostatic chuck (ESC) having a support surface;
• and
• one or more standoffs selectively coupled to the support surface, wherein the one or more standoffs are operable to support a workpiece at a predetermined standoff distance from the support surface, and wherein the one or more standoffs comprise a polyimide film.

An electrostatic chuck comprising one or more removable standoffs operable to support a workpiece at a predetermined distance from a surface of the electrostatic chuck.