Light generator including debris shielding assembly, photolithographic apparatus including the light generator, and method of manufacturing integrated circuit device using the photolithographic apparatus

A method of manufacturing an integrated circuit (IC) device, the method comprising:

• forming a photoresist layer on a substrate;
• and
• exposing the photoresist layer to light by using a photolithographic apparatus including a light generator,
• wherein the light generator includes:
• a chamber having a plasma generation space,
• an optical collector in the chamber, the optical collector having an aperture and a reflective surface, and
• a debris shielding assembly between the optical collector and the plasma generation space in the chamber,
• wherein the debris shielding assembly includes:
• a protective film spaced apart from the reflective surface with a protected space therebetween and facing the reflective surface, the protected space including an optical path, the protective film having a through hole at a position corresponding to the optical path in the protective film, and the through hole being spaced apart from the aperture with the protected space therebetween, and
• a protective frame that is in contact with an edge portion of the optical collector and supports the protective film.

A method of manufacturing an integrated circuit (IC) device, the method comprising:

• forming a photoresist layer on a substrate;
• and
• exposing the photoresist layer to light by using a photolithographic apparatus including a light generator,
• wherein the light generator includes:
• a chamber having a plasma generation space;
• an optical collector in the chamber, the optical collector having an aperture and a reflective surface;
• and
• a debris shielding assembly between the optical collector and the plasma generation space in the chamber,
• wherein the debris shielding assembly includes:
• a protective film facing the reflective surface with a protected space therebetween, the protected space including an optical path, the protective film having a through hole at a position corresponding to the optical path in the protective film, and the through hole being spaced apart from the aperture with the protected space therebetween, and
• a protective frame attaching the protective film to an edge of the optical collector, the protective frame extending along an entire perimeter of the edge of the optical collector.