Physical vapor deposition apparatus

A method for performing physical vapor deposition on a substrate using a physical vapor deposition (PVD) apparatus, comprising:

• supporting a target, which is made of gold, on a chamber wall of a chamber of the PVD apparatus via a backing plate coupled to a back surface of the target so that a front surface of the target faces the substrate;
• maintaining a distance between a back surface of the backing plate and a bottom surface of a plurality of magnets of the PVD apparatus at about 3.95 mm to about 4.45 mm;
• maintaining a distance between the front surface of the target and a front surface of the substrate at about 60.25 mm to about 60.75 mm;
• maintaining a distance between an inside corner of an upper portion of a shield and an upper corner, which meets a front surface of the backing plate, of a peripheral sidewall of the target at about 2.73 mm to about 3.23 mm;
• and
• a target assembly comprising a target made of gold and supported on the chamber wall via a backing plate coupled to a back surface of the target so that a front surface of the target faces the substrate;
• and
• performing PVD on the substrate.