Method for manufacturing electro-optical device, electro-optical device, and electronic apparatus

An electro-optical device, comprising:

• a first substrate in which a pixel electrode is provided;
• a second substrate in which a common electrode is provided;
• and
• an electro-optical layer disposed between the pixel electrode and the common electrode, and having optical characteristics varying in accordance with an electric field, wherein
• the first substrate or the second substrate includes
• a base member including a plurality of layers of which etching rates under a same etching condition differ from one another, the base member having light-transmissivity and provided with a concave portion corresponding to the pixel electrode, the concave portion passing through a part of the plurality of layers, and
• a lens layer disposed to fill inner sides of the concave portion and having a refractive index different from that of the base member, wherein the electro-optical device further comprises:
• a transistor corresponding to the pixel electrode,
• wherein the base member is disposed in a layer between the transistor and the pixel electrode,
• a layer closest to the transistor among the plurality of layers is thicker than other layers.