Apparatus for processing substrate

An apparatus for producing a substrate, comprising:

• an outer tube having an inner space;
• an inner reaction tube disposed to be spaced apart from an inner surface of the outer tube in the inner space of the outer tube and having an accommodation space therein;
• a substrate boat in which a plurality of substrates are loaded in a multistage manner and accommodated in an upper portion of the accommodation space of the inner reaction tube during substrate processing;
• a pedestal configured to support the substrate boat and accommodated in a lower portion of the accommodation space of the inner reaction tube during the substrate processing;
• a gas supply unit disposed on one side of the inner reaction tube;
• an exhaust duct vertically extending from the other side of the inner reaction tube to provide an inner passage communicating with an exhaust hole defined to pass through a sidewall of the inner reaction tube and disposed in a spaced space between the inner reaction tube and the outer tube to face the gas supply unit;
• a baffle comprising an opening and disposed in the inner passage of the exhaust duct to correspond to a boundary between an accommodation region of the substrate boat and an accommodation region of the pedestal in the accommodation space of the inner reaction tube;
• and
• an exhaust port communicating with a lower portion of the exhaust duct and disposed outside the exhaust duct to correspond to the accommodation region of the pedestal,
• wherein the exhaust duct extends up to an outside of the accommodation region of the pedestal, and
• wherein the exhaust hole comprises:
• a first exhaust hole defined to correspond to the accommodation region of the substrate boat;
• and
• a second exhaust hole defined to correspond to the accommodation region of the pedestal and disposed at the other side of the inner reaction tube,
• wherein the second exhaust hole faces the exhaust port.