PVD vacuum plating process for aluminum alloy surface

Abstract

A PVD vacuum plating process for an aluminum alloy surface is provided. The process includes forming a bottom layer: bombarding with an arc power supply, with a bias voltage being controlled at 200-300 V, and the time being controlled at 3-5 minutes; forming an intermediate multi-layer: conducting multilayer transition with an oxide and a nitride, with the number of layers being controlled at 8-10, the time for an individual layer being controlled at 10-20 minutes, and a target current being controlled at 10-20 A. The process also includes forming a transitional engagement layer: conducting mixed sputtering of a transition layer and a color layer for the time of 15-25 minutes; forming the color layer: controlling the time for the color layer at 20-30 minutes; and forming a protective layer: using a high-frequency and large-energy power supply with the time controlled at 40-50 minutes, the process thereby eliminating water plating steps.

Dependencies are inferred from the claim text.