Apparatus for treating exhaust gas in a processing system
AssigneeApplied Materials, Inc.
InventorsColin John Dickinson, Mehran Moalem, Daniel O. Clark
Life of this patent
Estimating the term…
Abstract
Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, a method for treating an exhaust gas in an exhaust conduit of a substrate processing system includes: flowing an exhaust gas from a process chamber into a plasma source via a foreline; injecting a reagent into the foreline; forming a plasma in the plasma source from the exhaust gas and the reagent; and injecting a cleaning gas into the foreline, wherein the cleaning gas and the reagent are different gases.
Claims10
A non-transitory computer readable medium having instructions stored thereon that, when executed, cause a method to be performed, the method comprising:
- injecting a reagent into a foreline, the foreline configured to remove exhaust gas from a process chamber;
- forming a plasma in a plasma source from the exhaust gas and the reagent;
- and injecting a cleaning gas into the foreline, wherein the cleaning gas and the reagent are different gases.
A system, comprising:
- a process chamber;
- a foreline to flow an exhaust gas from the process chamber;
- a plasma source coupled in-line with the foreline;
- a reagent delivery system to inject a reagent into the foreline;
- a gas panel to supply a flow of a cleaning gas to the foreline;
- and
- a controller configured to:
- inject the reagent into the foreline;
- form a plasma in the plasma source from the exhaust gas and the reagent;
- and
- inject the cleaning gas into the foreline, wherein the cleaning gas and the reagent are different gases.
Dependencies are inferred from the claim text.