Method for measurement of semiconductor device fabrication tool implement
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Wei Hung, Charng-Long Lu, Chien-Feng Lin
Life of this patent
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Abstract
Methods are described that include providing a laser-based measurement tool. An implement of a semiconductor fabrication process tool (e.g., susceptor) is delivered to the laser-based measurement tool where a plurality of measurements is performed of a surface of the implement using a blue wavelength radiation. The measurements are of a distance (e.g., angstroms) from a reference plane and provide an indication of the profile of the surface of the susceptor. As the surface profile of the susceptor can affect layers deposited on target substrates using the susceptor, the measurements provide for a disposition of the susceptor.
Claims19
A method, comprising:
- providing a measurement tool having a laser transmitting portion and a laser receiving portion;
- providing a susceptor having a surface;
- irradiating each of a plurality of points on the surface of the susceptor using a radiation beam generated by the laser transmitting portion;
- obtaining a reflectivity of the radiation beam received by the laser receiving portion from the irradiating;
- using the obtained reflectivity to determine a distance measurement for each of the plurality of points on the susceptor;
- storing the distance measurement for each of the plurality of points, wherein the distance measurements include a distance from a reference plane;
- using a process control system, generating a profile map of the surface of the susceptor using the stored distance measurements;
- and
- using the generated profile map to determine the susceptor requires replacement.
A method, comprising:
- providing a measurement tool having a laser transmitting portion and a laser receiving portion;
- providing an implement consisting of a susceptor of a semiconductor fabrication deposition tool;
- irradiating each of a plurality of points on a surface of the implement using a radiation beam generated by the laser transmitting portion, wherein the irradiating includes reflecting the radiation beam off of each of the plurality of points on the surface;
- collecting a measurement of a distance for each of the plurality of points on the surface of the implement, wherein the distance includes a distance from a reference plane, wherein the collecting the measurement includes obtaining a reflectivity of reflected radiation beam off of each of the plurality of points on the surface;
- and
- generating a profile map of the implement using the collected measurements to disposition the implement;
- and
- determining a disposition of the implement using the profile map.
A method, comprising:
- providing a measurement tool having a blue-wavelength laser transmitting portion and a blue-wavelength laser receiving portion;
- irradiating each of a plurality of points on a surface of a susceptor using a radiation beam generated by the blue-wavelength laser transmitting portion, wherein the susceptor is a wafer support device;
- using the blue-wavelength laser receiving portion to receive a respective reflected radiation beam from the irradiating of each of the plurality of points on the surface of the susceptor;
- using a parameter of the respective reflective radiation beam to determine a distance measurement for each of the points on the susceptor;
- storing the distance measurement for each of the plurality of points, wherein the distance measurements include a distance from a reference plane;
- and
- generating a profile map of the susceptor using the stored distance measurements;
- and
- using the generated profile map to disposition the susceptor.
Dependencies are inferred from the claim text.