Excimer laser apparatus and electronic-device manufacturing method

An electronic-device manufacturing method comprising:

• generating a laser beam by a laser system;
• the laser system including:
• an etalon spectrometer configured to measure a fringe waveform of the laser beam;
• and
• a controller configured to
• perform spectral-line-width measurement by obtaining an area of a first ratio in a total area of the fringe waveform, calculating a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrating the first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter, and
• perform update processing of the correlation function by performing deconvolution processing of a first spectral waveform obtained from the fringe waveform to calculate a second spectral waveform, calculating a third spectral line width based on the calculated second spectral waveform, and updating the correlation function based on a relation between the first spectral line width calibrated based on the correlation function and the third spectral line width:
• outputting the laser beam to an exposure apparatus;
• and
• exposing a photosensitive substrate to the laser beam by the exposure apparatus to manufacture an electronic device.

An excimer laser apparatus comprising:

• an etalon spectrometer configured to measure a fringe waveform of a laser beam with an image sensor;
• and
• a controller configured to obtain an area of a first ratio in a total area of the fringe waveform, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate the first spectral line width based on a correlation function representing a correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter, wherein
• the controller calculates the area of the first ratio by dividing the fringe waveform into a plurality of divided wavelength intervals corresponding to a plurality of channels of the image sensor, calculating a divided area of each divided wavelength interval, and integrating the divided areas.