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US 11,079,681 B2Granted
Lithography method for positive tone development
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing-Hui Weng, Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin
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Abstract
A lithography method includes forming a resist layer over a substrate. The resist layer is exposed to radiation. The exposed resist layer is developed using a developer that removes an exposed portion of the exposed resist layer, thereby forming a patterned resist layer. The patterned resist layer is rinsed using a basic aqueous rinse solution.
Claims20
A lithography method comprising:
- forming a resist layer over a substrate;
- exposing the resist layer to radiation;
- developing the exposed resist layer using a developer, thereby forming a patterned resist layer;
- providing a basic aqueous solution to the exposed resist layer during developing the exposed resist layer, wherein the developer is a first aqueous solution of a first base, the basic aqueous solution is a second aqueous solution of a second base, and the first base is different from the second base;
- and
- rinsing the patterned resist layer using a basic aqueous rinse solution.
3 more elements
A lithography method comprising:
- forming a resist layer over a substrate;
- exposing the resist layer to radiation;
- wetting the exposed resist layer using a basic aqueous solution;
- and
- after wetting the exposed resist layer using the basic aqueous solution, developing the exposed resist layer using a developer that removes an exposed portion of the exposed resist layer, thereby forming a patterned resist layer.
2 more elements
A lithography method comprising:
- forming a resist layer over a substrate;
- exposing the resist layer to radiation;
- developing the resist layer in a positive tone developer, thereby forming a patterned resist layer;
- and
- providing a basic aqueous solution to the resist layer during developing the resist layer, wherein a pH value of the basic aqueous solution is lower than a pH value of the positive tone developer, and a base concentration of the basic aqueous solution is lower than a base concentration of the positive tone developer.
2 more elements
Dependencies are inferred from the claim text.