High heat resistance resist composition and pattern forming method using the same
AssigneeMerck Patent GmbH
InventorsMasato Suzuki, Hiroshi Hitokawa, Tomohide Katayama
Life of this patent
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Abstract
[Problem] To provide a high heat resistance resist composition and a pattern formation method using the composition. [Solution] The present invention provides a chemically amplified negative-type resist composition comprising a particular polymer and a particular crosslinking agent, and this composition makes it possible to form a resist pattern of high sensitivity, of excellent resolution and of strong heat-resistance.
Claims14
A negative pattern formation method comprising the steps of coating a substrate with a chemically amplified negative-type resist composition comprising
- (I) a polymer containing the repeating unit represented by the following formula (Ia):
- in which
- A is hydrogen or a hydrocarbon group having 1 to 3 carbon atoms,
- B is a hydrocarbon group having 1 to 5 carbon atoms, and
- x is an integer of 0 or more,
- y is an integer of 1 or more,
- under the conditions of x+y≤5;
- (II) a crosslinking agent represented by the following formula (IIa)
- in which
- n is an integer of 1 or more,
- R1 is a substituted or unsubstituted hydrocarbon group having 1 to 15 carbon atoms, and
- R2 is hydrogen, hydroxyl or a substituted or unsubstituted hydrocarbon group having 1 to 15 carbon atoms;
- wherein at least one of said R1 and R2 is a naphthyl group;
- (III) an acid generating agent;
- and
- (IV) a solvent, to form a composition layer;
- (1) pre-baking said composition layer;
- (2) exposing to light the substrate coated with the composition layer after said pre-baking step;
- (3) carrying out post exposure baking after said exposure step;
- and
- carrying out development with an alkali aqueous solution after said post exposure baking step.
A negative pattern formation method comprising the steps of coating a substrate with a chemically amplified negative-type resist composition comprising
- (I) a polymer containing the repeating unit represented by the following formula (Ia):
- in which
- A is hydrogen or a hydrocarbon group having 1 to 3 carbon atoms,
- B is a hydrocarbon group having 1 to 5 carbon atoms, and
- x is an integer of 0 or more,
- y is an integer of 1 or more,
- under the conditions of x+y<5;
- (II) a crosslinking agent represented by the following formula (IIa)
- (IIa′)
- in which
- n is an integer of 1 to 3 or has an average molecular weight of 500 to 800,
- (Ill) an acid generating agent;
- and
- (IV) a solvent, to form a composition layer;
- (4) pre-baking said composition layer;
- (5) exposing to light the substrate coated with the composition layer after said pre-baking step;
- (6) carrying out post exposure baking after said exposure step;
- and
- carrying out development with an alkali aqueous solution after said post exposure baking step.
Dependencies are inferred from the claim text.