Near-infrared filter having chamfered dummy region and method of manufacturing the same

A method of manufacturing a near-infrared filter, the method comprising:

• a first step of preparing a glass substrate;
• a second step of forming a plurality of photoresist patterns in a two-dimensional arrangement on a front side and a rear side of the glass substrate;
• a third step of forming a prospective filter pedestal for defining a prospective dummy region around an individual photoresist pattern on at least one side of the front side and the rear side of the glass substrate by forming a plurality of blow holes for forming cracks using perforation around the individual photoresist pattern in the glass substrate;
• a fourth step of performing a wet etching process of the prospective dummy region together with the plurality of blow holes for forming cracks on the perforated glass substrate, so that the prospective dummy region is changed into a dummy-defining region and a chamfered side is formed in the dummy-defining region;
• a fifth step of removing the plurality of photoresist patterns from the etched glass substrate so that a filter-support intermediate defined by the plurality of etched blow holes for forming cracks is formed;
• a sixth step of subjecting the etched glass substrate to a chemical reinforcing process so that the filter-support intermediate is changed into a filter-support-seat body;
• and
• a seventh step of forming an optical filter layer covering the reinforced glass substrate so that near-infrared rays pass to the filter-support-seat body therethrough or are blocked thereby with respect to the filter-support-seat body.