Optical element with high scratch resistance

A method for producing an optical element, comprising:

• preparing a substrate that is transparent in the visible spectral region;
• vacuum depositing a multilayer anti-reflection coating onto the substrate by alternating layers of a first layer type having a first refractive index and a second layer type having a second, higher refractive index, wherein the second layer type comprises nitride or oxynitride and the first layer type comprises oxide of silicon and at least one other element, wherein the first layer type has a ratio of silicon to the at least one other element of at least 5:1, and wherein the multilayer anti-reflection coating has an uppermost layer that comprises the first layer type;
• and
• applying a layer of chain-form organofluoro molecules on the multilayer anti-reflection coating so that molecules of the layer are bonded at their ends to the uppermost layer,
• wherein the layer and the multilayer anti-reflection coating reduce, when compared to the multilayer anti-reflection coating without the layer, an increase in haze-value after a modified Bayer test on a plurality of samples according to ASTM F735-11 with 8000 cycles;
• and
• wherein the optical element is configured for a use selected from the group consisting of a closing element, a window of optics of a camera, a sensor, and a cover glass for watches, objectives or optical measuring instruments.

An optical element with high scratch resistance, comprising:

• a substrate that is transparent in the visible spectral region;
• a multilayer anti-reflection coating comprising a first, uppermost layer of a first layer type, a second layer of a second layer type, a third layer of the first layer type, and a fourth, bottommost layer of the second layer type on the substrate, wherein the first layer type has a first refractive index and comprises oxide of silicon and at least one other element in a ratio of silicon to the at least one other element of at least 5:1, wherein the second layer type has a second, higher refractive index and comprises nitride or oxynitride, wherein the second layer has a layer thickness that is a greatest layer thickness within the multilayer anti-reflection coating and amounts to at least 40% of a thickness of the multilayer anti-reflection coating;
• and
• a layer of chain-form organofluoro molecules on the multilayer anti-reflection coating, the layer having molecules that are bonded at their ends to the uppermost layer,
• wherein the layer of chain-form organofluoro molecules and the multilayer anti-reflection coating reduce, when compared to the multilayer anti-reflection coating without the layer, an increase in haze-value after a modified Bayer test on a plurality of samples according to ASTM F735-11 with 8000 cycles;
• and
• wherein the optical element is configured for a use selected from the group consisting of a closing element, a window of optics of a camera, a sensor, and a cover glass for watches, objectives or optical measuring instruments.

An optical element with high scratch resistance, comprising:

• a substrate that is transparent in the visible spectral region;
• a multilayer anti-reflection coating comprising a first, uppermost layer of a first layer type, a second layer of a second layer type, a third layer of the first layer type, and a fourth, bottommost layer of the second layer type on the substrate, wherein the first layer type has a first refractive index and comprises oxide of silicon and at least one other element in a ratio of silicon to the at least one other element of at least 5:1, wherein the second layer type has a second, higher refractive index and comprises nitride or oxynitride, wherein the second layer has a layer thickness that is a greatest layer thickness within the multilayer anti-reflection coating and amounts to at least 40% of a thickness of the multilayer anti-reflection coating;
• and
• a layer of chain-form organofluoro molecules on the multilayer anti-reflection coating, the layer having molecules that are bonded at their ends to the uppermost layer,
• wherein the layer of chain-form organofluoro molecules and the multilayer anti-reflection coating reduce by 27% when compared to the multilayer anti-reflection coating without the layer of chain-form organofluoro molecules, an increase in haze-value after a modified Bayer test on a plurality of samples according to ASTM F735-11 with 8000 cycles.