US 11,078,337 B2 · High-χ block copolymers for directed self-assembly

Abstract

The present invention is broadly concerned with novel directed self-assembly compositions, processes utilizing those compositions, and the resulting structures that are formed. The composition comprises a block copolymer of polystyrene and a polymethylmethacrylate block with polylactic acid side chains (“PS-b-P(MMA-LA)”). The block copolymer is capable of crosslinking and micro-phase separating into lines and spaces measuring about 10-nm or smaller with sub-20 nm L0 capability. Additionally, PS-b-P(MMA-LA) can be thermally annealed without a top-coat for simpler processing than the prior art. The polylactic acid side chains also increase the etch rate of the poly(methylmethacrylate) block when exposed to oxygen plasma, as well as lower the Tg.

Claims17

Dependent claims

A method of forming a microelectronic structure, said method comprising:

providing a stack comprising:
a substrate having a surface;
and
one or more optional intermediate layers on said substrate surface;
applying a composition to said intermediate layers, if present, or to said substrate surface, if no intermediate layers are present, said composition comprising a block copolymer comprising a first block and a second block, said first block being a copolymer that includes recurring monomers comprising lactic acid moieties that are present as side chains on said recurring monomers;
and
causing said composition to self-assemble into a self-assembled layer, wherein said self-assembled layer comprises a first self-assembled region and a second self-assembled region different from said first self-assembled region.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/841,472Filed 14 Dec 2017 · us provisional application

Priority

14 Dec 2016

Published

US 2018/0163003 A114 Jun 2018

Granted

3 Aug 2021

Term ends

Not estimatedThe source records don’t support an estimate.

Classification24 codes

C08G 81/027
Block or graft polymers containing sequences of polymers of C08C or C08F and of polymers of C08G: containing polyester or polycarbonate sequences
B32B 27/28
Layered products comprising a layer of synthetic resin: comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 -…
C08F 293/00
Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable
C08F 293/005
Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains…:…

High-χ block copolymers for directed self-assembly

Life of this patent

High-χ block copolymers for directed self-assembly

Life of this patent

Abstract

Claims17