Precursors for the atomic layer deposition of transition metals and methods of use
AssigneeApplied Materials, Inc.
InventorsJeffrey W. Anthis, Atashi Basu
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AssigneeApplied Materials, Inc.
InventorsJeffrey W. Anthis, Atashi Basu
Estimating the term…
Metal coordination complexes comprising at least one diazabutadiene based ligand having a structure represented by: where A1, A2, A3, and A4 are atoms in a 6-membered ring and are independently selected from C, N, O, S, and P; and where R1, R2, R3, R4, R5, and R6 are independently selected from the group consisting of H, amino groups, C1-C6 alkyl groups, or C4-10 cycloalkyl groups; and further provided that alkyl groups may optionally contain silicon; and where the metal coordination complex is capable of participating in a Diels-Alder type reaction with a dienophile. Processing methods using the metal coordination complexes are also described.
A processing method comprising exposing a substrate to a first reactive gas comprising a metal coordination complex and a second reactive gas comprising a dienophile comprising one or more of an alkene, an alkyne or plasma thereof to form a metal-containing film through a Diels-Alder reaction, the metal coordination complex comprising at least one ligand according to
Dependencies are inferred from the claim text.